MPCVD法金剛石同質(zhì)外延生長及MOS器件技術(shù)Homogeneous epitaxial diamond growth by MPCVD and its MOS device technology張金風西安電子科技大學教授ZHANG JinfengProfessor of Xidian University
SiC MOS器件氧化后退火新途徑低溫再氧化退火技術(shù)A new approach of post-oxidation annealing for SiC MOS devices -- the low-temperature re-oxidation annealing technology王德君大連理工大學教授Wang DejunProfessor of Dalian University of Technology
